Metallographic Microscope

硅片缺陷观测仪(HS-WDI)

Application
Semiconductor wafer
Solar wafer
Solar Cell
Thin-film Cell
硅片放大100倍效果

Can measure distance between any two points
Large advanced light and dark field objective, long working distance , high definition vision
Stable, high-quality optical system, better contrast image
 

硅片放大200倍效果

硅片放大200倍效果

硅片放大400倍效果

Magnification: 50X-1000X
Digital camera: > 300 million pixel CCD
X, Y move range: 150mm × 180mm
Resolution:0.00042mm
Accuracy:±1μm
Magnification:100X(objective),10/15X(Eyepiece)